Kosinova Marina Leonidovna
Main field – chemical vapor deposition (CVD) and plasma-enhanced chemical vapor deposition (PECVD) of dielectric and semiconductors films, thermodynamic modelling of CVD processes;
Current research interests - CVD and PECVD of the BN, BCN, SiCN, SiBCN films and structures, h-BN and carbon nanowalls films and structures from organic precursors; Kinetics and chemistry of film formation process; Morphological and chemical structure of the deposited films; Electrical, mechanical and optical properties of the films; Film structure - property relationships.